ASML

Public companyNL1 field

Where it works

Technology	Role	Source
Advanced semiconductorsBuilds EUV and High-NA EUV lithography systems used for leading-edge nodes.	Builds EUV and High-NA EUV lithography systems used for leading-edge nodes.	asml.com

DealSep 8

Samsung plans High-NA EUV for future DRAM and joins the 12-inch photomask effort.

AnnouncementSep 8

They aim for a 12-inch mask pilot line by 2031.

MilestoneSep 8

High NA is used on select layers of Panther Lake in volume production.

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